Water Processing Photoresist Film: Tips and Tricks

Michael Sullivan is the marketing manager for IKONICS Corporation. He currently manages the Marketing Department for IKONICS Corporation divisions, including IKONICS Imaging, Chromaline Screen Print Products, IKONICS Advanced Materials Solutions, and IKONICS Industrial Inkjet Solutions.

First, note that image development and drying are not necessary with advanced dry-processing photoresist films.

Water processing photoresist film can be washed out at water temperatures up to 120 F at 50 to 1250 psi. Washout can range anywhere from 20 seconds to 2 minutes depending on the thickness of the film and detail of the artwork. Warm water and high pressure are recommended to increase production and decrease the washout time. Use a gentle, steady sweeping motion from about 6 to 12 inches away from the photoresist film.

–Michael Sullivan, IKONICS Imaging