First, note that image development and drying are not necessary with advanced dry-processing photoresist films.
Water processing photoresist film can be washed out at water temperatures up to 120 F at 50 to 1250 psi. Washout can range anywhere from 20 seconds to 2 minutes depending on the thickness of the film and detail of the artwork. Warm water and high pressure are recommended to increase production and decrease the washout time. Use a gentle, steady sweeping motion from about 6 to 12 inches away from the photoresist film.
–Michael Sullivan, IKONICS Imaging